Fluid ejection devices with reduced crosstalk

ABSTRACT

A fluid ejection apparatus includes a plurality of fluid ejectors. Each fluid ejector includes a pumping chamber, and an actuator configured to cause fluid to be ejected from the pumping chamber. The fluid ejection apparatus includes a feed channel fluidically connected to each pumping chamber; and at least one compliant structure formed in a surface of the feed channel. The at least one compliant structure has a lower compliance than the surface of the feed channel.

CROSS-REFERENCE TO RELATED APPLICATION(S)

This application is a continuation of U.S. patent application Ser. No.16/013,835, filed Jun. 20, 2018, to be U.S. Pat. No. 10,913,264, issuingFeb. 9, 2021, which is a divisional of and claims the benefit ofpriority to U.S. patent application Ser. No. 14/695,525, filed Apr. 24,2015, now U.S. Pat. No. 10,022,957, issued Jul. 17, 2018. The contentsof the prior applications are hereby incorporated by reference.

TECHNICAL FIELD

The present disclosure relates generally to fluid ejection devices.

BACKGROUND

In some fluid ejection devices, fluid droplets are ejected from one ormore nozzles onto a medium. The nozzles are fluidically connected to afluid path that includes a fluid pumping chamber. The fluid pumpingchamber can be actuated by an actuator, which causes ejection of a fluiddroplet. The medium can be moved relative to the fluid ejection device.The ejection of a fluid droplet from a particular nozzle is timed withthe movement of the medium to place a fluid droplet at a desiredlocation on the medium. Ejecting fluid droplets of uniform size andspeed and in the same direction enables uniform deposition of fluiddroplets onto the medium.

SUMMARY

When an actuator of a fluid ejector is activated, a pressure fluctuationcan propagate from the pumping chamber into the connected inlet andoutlet feed channels. This pressure fluctuation can propagate into otherfluid ejectors that are connected to the same inlet or outlet feedchannel. This fluidic crosstalk can adversely affect the print quality.

To mitigate the propagation of pressure fluctuations, compliantmicrostructures can be formed in one or more surfaces of the inlet feedchannel, the outlet feed channel, or both. The presence of compliantmicrostructures in a feed channel increases the compliance available inthe surfaces of the feed channel, attenuating the pressure fluctuationsthat occur in that feed channel. In some examples, the compliantmicrostructures include recesses formed in a bottom surface of the feedchannel. A membrane covers the recesses and deflects into the recessesresponsive to an increase in pressure in the feed channel, thusattenuating the pressure fluctuation. In some examples, the compliantmicrostructures include nozzle-like structures formed in the bottomsurface of the feed channel. When the pressure in the feed channelincreases, a meniscus at an outward facing opening of each nozzle-likestructure can attenuate the pressure fluctuation. The presence of suchcompliant microstructures can thus reduce fluidic crosstalk among fluidejectors connected to the same inlet or outlet feed channel, thusstabilizing the drop size and velocity of the fluid ejected from eachfluid ejectors and enabling precise and accurate printing.

In a general aspect, a fluid ejection apparatus includes a plurality offluid ejectors. Each fluid ejector includes a pumping chamber, and anactuator configured to cause fluid to be ejected from the pumpingchamber. The fluid ejection apparatus includes a feed channelfluidically connected to each pumping chamber; and at least onecompliant structure formed in a surface of the feed channel. The atleast one compliant structure has a lower compliance than the surface ofthe feed channel.

Embodiments can include one or more of the following features.

The at least one compliant structure comprises multiple recesses formedin the surface of the feed channel; and a membrane disposed over therecesses. In some cases, the membrane seals the recesses. In some cases,the depth of each recess is less than the thickness of the surface ofthe feed channel. In some cases, the membrane is configured to deflectinto the recesses responsive to an increase in fluid pressure in thefeed channel. In some cases, the recesses are formed in one or more of abottom wall or a top wall of the feed channel. In some cases, therecesses are formed in a side wall of the feed channel.

The at least one compliant structure comprises one or more dummy nozzlesformed in the surface of the feed channel. In some cases, each dummynozzle includes a first opening on an internal surface of the surfaceand a second opening on an external surface of the surface. In somecases, a convex meniscus is formed at the second opening responsive toan increase in fluid pressure in the feed channel. In some cases, eachfluid ejector includes a nozzle formed in a nozzle layer, and whereinthe dummy nozzles are formed in the nozzle layer. In some cases, thedummy nozzles are substantially the same size as the nozzles.

Each fluid ejector includes a nozzle formed in a nozzle layer, andwherein the nozzle layer comprises the surface of the feed channel.

Each fluid ejector includes an actuator and a nozzle, and whereinactuation of one of the actuators causes fluid to be ejected from thecorresponding nozzle. In some cases, actuation of one of the actuatorscauses a change in fluid pressure in the feed channel, and wherein theat least one compliant structure is configured to at least partiallyattenuate the change in fluid pressure in the feed channel.

In a general aspect, a method includes forming a plurality of nozzles ina nozzle layer; forming at least one compliant structure in the nozzlelayer, wherein the at least one compliant structure has a lowercompliance than the nozzle layer; and attaching the nozzle layer to asubstrate comprising a plurality of fluid ejectors, each fluid ejectorcomprising a pumping chamber and an actuator configured to cause fluidto be ejected from the pumping chamber.

Embodiments can include one or more of the following features.

Forming at least one compliant structure in the nozzle layer comprises:forming a plurality of recesses in the nozzle layer; and disposing amembrane over the recesses. In some cases, disposing a membrane over therecesses comprises: depositing a membrane layer over a top surface ofthe nozzle layer; and removing a portion of the membrane layer over eachnozzle.

Forming a plurality of nozzles comprises forming the plurality ofnozzles in a first layer, and wherein forming at least one compliantstructure comprises: forming the at least one compliant structure in asecond layer; and attaching the first layer to the second layer.

Forming at least one compliant structure in the nozzle layer comprises:forming the at least one compliant structure in a first layer; andattaching the first layer to a second layer having the plurality ofnozzles formed therein, wherein the first layer and the second layertogether form the nozzle layer.

Forming at least one compliant structure in the nozzle layer comprisesforming one or more dummy nozzles in the nozzle layer.

In a general aspect, a method includes actuating a fluid ejector in afluid ejection apparatus. Actuation of the fluid ejector causes a changein fluid pressure in a feed channel fluidically connected to the fluidejector. The method includes deflecting a membrane into a recess formedin a surface of the feed channel responsive to the change in fluidpressure in the feed channel.

Embodiments can include one or more of the following features.

Deflecting the membrane into the recess comprises reversibly deflectingthe membrane.

The approaches described here can have one or more of the followingadvantages. The presence of compliant microstructures, such as recessesor dummy nozzles, in the surface of a feed channel can mitigate fluidiccrosstalk among fluid ejectors fluidically connected to that feedchannel. For instance, compliant microstructures can increase thecompliance available in the surfaces of a feed channel, thus allowingthe energy from a pressure fluctuation caused by the actuation of anactuator in a fluid ejector to be attenuated. As a result, the effect ofthe pressure fluctuation on other fluid ejectors connected to that feedchannel can be reduced. By reducing fluidic crosstalk among fluidejectors in a printhead, the drop size and velocity of the fluid ejectedfrom the fluid ejectors can be stabilized, thus enabling precise andaccurate printing.

The details of one or more embodiments are set forth in the accompanyingdrawings and the description below. Other features, aspects, andadvantages will become apparent from the description, the drawings, andthe claims.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a cross sectional view of a printhead.

FIG. 2 is a cross sectional view of a portion of a printhead.

FIG. 3 is a cross sectional view of a fluid ejector.

FIG. 4A is a cross sectional view of a portion of the printhead takenalong line B-B in FIG. 2.

FIG. 4B is a cross sectional view of a portion of the printhead takenalong line C-C in FIG. 2.

FIGS. 5A and 5B are a top view and a side view, respectively, of a feedchannel with recesses.

FIGS. 6A-6F are diagrams of an approach to fabricating fluid ejectorshaving recesses.

FIG. 7 is a flowchart.

FIGS. 8A-8F are diagrams of an approach to fabricating fluid ejectorshaving recesses.

FIG. 9 is a flowchart.

FIG. 10 is a cross sectional view of a fluid ejector having side wallcompliant microstructures.

FIG. 11 is a side view of a feed channel with dummy nozzles.

FIG. 12 is a diagram of an approach to fabricating fluid ejectors havingdummy nozzles.

Like reference numbers and designations in the various drawings indicatelike elements.

DETAILED DESCRIPTION

Referring to FIG. 1, a printhead 100 can be used for ejecting dropletsof fluid, such as ink, biological liquids, polymers, liquids for formingelectronic components, or other types of fluid, onto a surface. Theprinthead 100 includes a casing 410 with an interior volume that isdivided into a fluid supply chamber 432 and a fluid return chamber 436,e.g., by an upper divider 530 and a lower divider 440.

The bottom of the fluid supply chamber 432 and the fluid return chamber436 is defined by the top surface of an interposer assembly. Theinterposer assembly can be attached to a lower printhead casing 410,such as by bonding, friction, or another mechanism of attachment. Theinterposer assembly can include an upper interposer 420 and a lowerinterposer 430 positioned between the upper interposer 420 and asubstrate 110.

The upper interposer 420 includes a fluid supply inlet 422 and a fluidreturn outlet 428. For instance, the fluid supply inlet 422 and fluidreturn outlet 428 can be formed as apertures in the upper interposer420. A flow path 474 is formed in the upper interposer 420, the lowerinterposer 430, and the substrate 110. Fluid can flow along the flowpath 474 from the supply chamber 432 into the fluid supply inlet 422 andto one or more fluid ejection devices (described in greater detailbelow) for ejection from the printhead 100. Fluid can also flow alongthe flow path 474 from one or more fluid ejection devices into the fluidreturn outlet 428 and into the return chamber 436. In FIG. 1, a singleflow path 474 is shown as a straight passage for illustrative purposes;however, the printhead 100 can include multiple flow paths 474, and theflow paths 474 are not necessarily straight.

Referring to FIGS. 2 and 3, the substrate 110 can be a monolithicsemiconductor body, such as a silicon substrate. Passages through thesubstrate 110 define a flow path for fluid through the substrate 110. Inparticular, a substrate inlet 12 receives fluid from the supply chamber432, extends through a membrane 66 (discussed in more detail below), andsupplies fluid to one or more inlet feed channels 14. Each inlet feedchannel 14 supplies fluid to multiple fluid ejectors 150 through acorresponding inlet passage (not shown). For simplicity, only one fluidejector 150 is shown in FIGS. 2 and 3. Each fluid ejector includes anozzle 22 formed in a nozzle layer 11 that is disposed on a bottomsurface of the substrate 110. In some examples, the nozzle layer 11 isan integral part of the substrate 110; in some examples, the nozzlelayer 11 is a layer that is deposited onto the surface of the substrate110. Fluid can be selectively ejected from the nozzle 22 of one or moreof the fluid ejectors 150 to print onto a surface.

Fluid flows through each fluid ejector 150 along an ejector flow path475. The ejector flow path 475 can include a pumping chamber inletpassage 17, a pumping chamber 18, a descender 20, and an outlet passage26. The pumping chamber inlet passage 17 fluidically connects thepumping chamber 18 to the inlet feed channel 14 and can include, e.g.,an ascender 16 and a pumping chamber inlet 15. The descender 20 isfluidically connected to a corresponding nozzle 22. An outlet passage 26connects the descender 20 to an outlet feed channel 28, which is influidic connection with the return chamber 436 through a substrateoutlet (not shown).

In the example of FIGS. 2 and 3, passages such as the substrate inlet12, the inlet feed channel 14, and the outlet feed channel 28 are shownin a common plane. In some examples (e.g., in the examples of FIGS. 3Aand 3B), one or more of the substrate inlet 12, the inlet feed channel14, and the outlet feed channel 28 are not in a common plane with theother passages.

Referring to FIGS. 4A and 4B, the substrate 110 includes multiple inletfeed channels 14 formed therein and extending parallel with one another.Each inlet feed channel 14 is in fluidic communication with at least onesubstrate inlet 12 that extends perpendicular to the inlet feed channels14. The substrate 110 also includes multiple outlet feed channels 28formed therein and extending parallel with one another. Each outlet feedchannel 28 is in fluidic communication with at least one substrateoutlet (not shown) that extends perpendicular to the outlet feedchannels 28. In some examples, the inlet feed channels 14 and the outletfeed channels 28 are arranged in alternating rows.

The substrate includes multiple fluid ejectors 150. Fluid flows througheach fluid ejector 150 along a corresponding ejector flow paths 475,which includes an ascender 16, a pumping chamber inlet 15, a pumpingchamber 18, and a descender 20. Each ascender 16 is fluidicallyconnected to one of the inlet feed channels 14. Each ascender 16 is alsofluidically connected to the corresponding pumping chamber 18 throughthe pumping chamber inlet 15. The pumping chamber 18 is fluidicallyconnected to the corresponding descender 20, which leads to theassociated nozzle 22. Each descender 20 is also connected to one of theoutlet feed channels 28 through the corresponding outlet passage 26. Forinstance, the cross-sectional view of fluid ejector of FIG. 3 is takenalong line 2-2 of FIG. 4A.

The particular flow path configuration described here is an example of aflow path configuration. The approaches described here can also be usedin other flow path configurations.

In some examples, the printhead 100 includes multiple nozzles 22arranged in parallel columns 23. The nozzles 22 in a given column 23 canbe all fluidically connected to the same inlet feed channel 14 and thesame outlet feed channel 28. That is, for instance, all of the ascenders16 in a given column can be connected to the same inlet feed channel 14and all of the descenders in a given column can be connected to the sameoutlet feed channel 28.

In some examples, nozzles 22 in adjacent columns can all be fluidicallyconnected to the same inlet feed channel 14 or the same outlet feedchannel 28, but not both. For instance, in the example of FIG. 4A, eachnozzle 22 in column 23 a is fluidically connected to the inlet feedchannel 14 a and to the outlet feed channel 28 a. The nozzles 22 in theadjacent column 23 b are also connected to the inlet feed channel 14 abut are connected to the outlet feed channel 28 b. In some examples,columns of nozzles 22 can be connected to the same inlet feed channel 14or the same outlet feed channel 28 in an alternating pattern. Furtherdetails about the printhead 100 can be found in U.S. Pat. No. 7,566,118,the contents of which are incorporated herein by reference in theirentirety.

Referring again to FIG. 2, each fluid ejector 150 includes acorresponding actuator 30, such as a piezoelectric transducer or aresistive heater. The pumping chamber 18 of each fluid ejector 150 is inclose proximity to the corresponding actuator 30. Each actuator 30 canbe selectively actuated to pressurize the corresponding pumping chamber18, thus ejecting fluid from the nozzle 22 that is connected to thepressurized pumping chamber.

In some examples, the actuator 30 can include a piezoelectric layer 31,such as a layer of lead zirconium titanate (PZT). The piezoelectriclayer 31 can have a thickness of about 50 μm or less, e.g., about 1 μmto about 25 μm, e.g., about 2 μm to about 5 μm. In the example of FIG.2, the piezoelectric layer 31 is continuous. In some examples, thepiezoelectric layer 31 can be made discontinuous, e.g., by an etching orsawing step during fabrication. The piezoelectric layer 31 is sandwichedbetween a drive electrode 64 and a ground electrode 65. The driveelectrode 64 and the ground electrode 65 can be metal, such as copper,gold, tungsten, indium-tin-oxide (ITO), titanium, platinum, or acombination of metals. The thickness of the drive electrode 64 and theground electrode 65 can be, e.g., about 2 μm or less, e.g., about 0.5μm.

A membrane 66 is disposed between the actuator 30 and the pumpingchamber 18 and isolates the ground electrode 65 from fluid in thepumping chamber 18. In some examples, the membrane 66 is a separatelayer; in some examples, the membrane is unitary with the substrate 110.In some examples, the actuator 30 does not include a membrane 66, andthe ground electrode 65 is formed on the back side of the piezoelectriclayer 31 such that the piezoelectric layer 31 is directly exposed tofluid in the pumping chamber 18.

To actuate the piezoelectric actuator 30, an electrical voltage can beapplied between the drive electrode 64 and the ground electrode 65 toapply a voltage to the piezoelectric layer 31. The applied voltagecauses the piezoelectric layer 31 to deflect, which in turn causes themembrane 66 to deflect. The deflection of the membrane 66 causes achange in volume of the pumping chamber 18, producing a pressure pulse(also referred to as a firing pulse) in the pumping chamber 18. Thepressure pulse propagates through the descender 20 to the correspondingnozzle 22, thus causing a droplet of fluid to be ejected from the nozzle22.

The membrane 66 can formed of a single layer of silicon (e.g., singlecrystalline silicon), another semiconductor material, one or more layersof oxide, such as aluminum oxide (AlO2) or zirconium oxide (ZrO2),glass, aluminum nitride, silicon carbide, other ceramics or metals,silicon-on-insulator, or other materials. For instance, the membrane 66can be formed of an inert material that has a compliance such that theactuation of the actuator 30 causes flexure of the membrane 66sufficient to cause a droplet of fluid to be ejected. In some examples,the membrane 66 can be secured to the actuator 30 with an adhesive layer67. In some examples, two or more of the substrate 110, the nozzle layer11, and the membrane 66 can be formed as a unitary body.

In some cases, when the actuator 30 of one of the fluid ejectors 150 isactuated, a pressure fluctuation can propagate through the ascender 16of the fluid ejector 150 and into the inlet feed channel 14. Likewise,energy from the pressure fluctuation can also propagate through thedescender 20 of the fluid ejector 150 and into the outlet feed channel28. In some cases, this application refers to the inlet feed channel 14and the outlet feed channel 28 generally as a feed channel 14, 28.Pressure fluctuations can thus develop in one or more of the feedchannels 14, 28, that are connected to an actuated fluid ejector 150. Insome cases, these pressure fluctuations can propagate into the ejectorflow paths 475 of other fluid ejectors 150 that are connected to thesame feed channel 14, 28. These pressure fluctuations can adverselyaffect the drop volume and/or the drop velocity of drops ejected fromthose fluid ejectors 150, degrading print quality. For instance,variations in drop volume can cause the amount of fluid that is ejectedto vary, and variations in drop velocity can cause the location wherethe ejected drop is deposited onto the printing surface to vary. Theinducement of pressure fluctuations in fluid ejectors is referred to asfluidic crosstalk.

In some examples, fluidic crosstalk can be caused by slow dissipation ofthe pressure fluctuations in the feed channels 14, 28. In some examples,fluidic crosstalk can be caused by standing waves that develop in thefeed channels 14, 28. For instance, a pressure fluctuation thatpropagates into a feed channel 14, 28 when the actuator 30 of one of thefluid ejectors 150 is actuated can develop into a standing wave. Whenfluid ejection occurs at a frequency that reinforces the standing wave,the standing wave in the feed channel 14, 28 can cause pressureoscillations to propagate into the ejector flow paths 475 of other fluidejectors 150 connected to the same feed channel 14, 28, causing fluidiccrosstalk among those fluid ejectors 150.

Fluidic crosstalk can also be caused by a sudden change in fluid flowthrough the feed channels 14, 28. In general, when a fluid in motion ina flow channel is forced to stop or change direction suddenly, apressure wave can propagate in the flow channel (sometimes referred toas the “water hammer” effect). For instance, when one or more fluidejectors 150 connected to the same feed channel 14, 28 are suddenlyturned off, the water hammer effect causes a pressure wave to propagateinto the flow channel 14, 28. That pressure wave can further propagateinto the ejector flow paths 475 of other fluid ejectors 150 that areconnected to the same feed channel 14, 28, causing fluidic crosstalkamong those fluid ejectors 150.

Fluidic crosstalk can be reduce by providing greater compliance in thefluid ejectors to attenuate the pressure fluctuations. By increasing thecompliance available in the fluid ejectors, the energy from a pressurefluctuation generated in one of the fluid ejectors can be attenuated,thus reducing the effect of the pressure fluctuation on the neighboringfluid ejectors.

Compliance in a fluid ejector and its associated fluid flow passages isavailable in the fluid, the meniscus at the nozzle, and the surfaces ofthe fluid flow passages (e.g., the inlet feed channel 14, the pumpingchamber inlet passage 17, the descender 20, the outlet passage 26, theoutlet feed channel 28, and other fluid flow passages).

The compliance of the fluid in the feed channel is given by

$C_{fluid} = \frac{V}{B}$

where V is the volume of the fluid in the feed channel and B is the bulkmodulus of the fluid.

The compliance of a single meniscus is given by

$C_{meniscus} = \frac{\pi r^{4}}{3\sigma}$

where r is the radius of the meniscus and σ is the surface tension.

The compliance of a rectangular surface (such as a surface of the inletor outlet feed channel) is given by (for fixed end conditions)

$C_{wall} = {\frac{1}{60}\frac{{lw}^{5}}{{Et}_{w}^{3}}}$

where l, w, and t_(w) are the length, width, and thickness of thesurface, respectively. Each surface of the inlet and outlet feedchannels has some compliance. In some fluid ejectors, the most compliantsurface of the feed channel is the bottom surface formed by the siliconnozzle layer 11.

In one specific example, a printhead has a feed channel (e.g., an inletfeed channel 14 or an outlet feed channel 28) that serves 16 fluidejectors (hence there are 16 menisci associated with the feed channel).The feed channel has a width of 0.39 mm, a depth of 0.27 mm, and alength of 6 mm. The thickness of the silicon nozzle layer 11 is 30 μmand the modulus of the nozzle layer is 186E9 Pa. The radius of eachmeniscus is 7 μm. A typical bulk modulus for a water-based inks is aboutB=2E9 Pa and a typical surface tension is about 0.035 N/m.

For this example, the compliance of the fluid in the feed channel, the16 menisci, and the nozzle layer in the feed channel are given inTable 1. Notably, the nozzle layer in the feed channel has the lowestcompliance.

TABLE 1 Compliance values for the fluid in the feed channel, the menisciof the 16 nozzles fed by the feed channel, and the nozzle layer of thefeed channel. Compliance (m³/Pa) Fluid 316E−21 Menisci 1.15E−18  Nozzlelayer 180E−21

Increasing the compliance in a fluid ejector 150 and its associatedfluid flow passages can help to mitigated fluidic crosstalk among fluidejectors 150. By increasing the available compliance, the propagation ofa pressure fluctuation from a particular fluid ejector 150 to aneighboring fluid ejector 150 can be attenuated within the fluid ejector150 s or the inlet and/or outlet feed channels 14, 28 to which the fluidejector 150 is connected, thus reducing the effect of that pressurefluctuation on other fluid ejectors 150. For instance, the compliance ofa feed channel 14, 28 can be increased to mitigate fluidic crosstalkamong fluid ejectors 150 connected to that feed channel 14, 28.

Referring again to FIG. 3, compliance can be added to the inlet feedchannel 14, the outlet feed channel 28, or both, by forming compliantmicrostructures 50 on one or more surfaces of the inlet feed channel 14and/or the outlet feed channel 28. For instance, in the example of FIG.3, compliant microstructures 50 are formed in a bottom surface 52 of theinlet feed channel 14 and a bottom surface 54 of the outlet feedchannel. In this example, the bottom surfaces 52, 54 are formed by thenozzle layer 11. The additional compliance provided by the compliantmicrostructures 50 in a feed channel 14, 28 attenuates the energy from apressure fluctuation in a particular fluid ejector 150 that is connectedto that feed channel 14, 28. As a result, the effect of that pressurefluctuation on other fluid ejectors 150 connected to that same feedchannel 14, 28 can be reduced.

Referring to FIGS. 5A and 5B, in some embodiments, the compliantmicrostructures 50 formed in the nozzle layer 11 of the inlet feedchannel 14 and/or the outlet feed channel 28 can be recesses 500 coveredby a thin membrane 502. The membrane 502 is disposed over the recesses500 such that an inner surface 504 of the nozzle layer 11 facing intothe feed channel 14, 28 is substantially flat. In some cases, e.g., whena vacuum is present in the recess 500, the membrane 502 can be slightlydeflected into the recess 500. In some examples, the recesses 500 can beformed in the nozzle layer 11, which we also refer to as the bottom wallof the inlet or outlet feed channel 14, 28. In some examples, therecesses 500 can be formed in a top wall of the inlet or outlet feedchannel, which is the wall opposite the bottom wall. In some examples,the recesses 500 can be formed in one or more side walls of the inlet oroutlet feed channel 14, 28, which are the walls that intersect the topand bottom walls.

When a pressure fluctuation propagates into the feed channel 14, 28, themembrane 502 can deflect into the recesses, attenuating the pressurefluctuation and mitigating fluidic crosstalk among neighboring fluidejectors 150 connected to that feed channel 14, 28. The deflection ofthe membrane 502 is reversible such that when the fluid pressure in thefeed channel 14, 28 is reduced, the membrane 502 returns to its originalconfiguration.

The recesses 500 can have a lateral dimension (e.g., a radius) ofbetween about 50 μm and about 150 μm, e.g., about 100 μm. For instance,the lateral dimension of the recesses 500 can be between about 10% andabout 75% of the width of the feed channel surface, e.g., about 50% ofthe width of the feed channel surface. The recesses 500 can have a depthof between about 5 μm and about 15 μm, e.g., about 6-10 μm. The recesses500 can be provided at a density of between about 10 recesses/mm² andabout 50 recesses/mm², e.g., about 20 recesses/mm². In the example ofFIGS. 5A and 5B, the recesses 500 are circular. In some examples, therecesses 500 can be other shapes, such as ovals, ellipses, or othershapes. For instance, the recesses 500 can be shaped such that there areno sharp corners where mechanical stresses can be concentrated. Therecesses 500 can be positioned in ordered arrays, e.g., rows andcolumns, although this is not necessary. For example, the recesses 500can be randomly distributed.

In some examples, the membrane 502 can be formed of silicon. In someexamples, the membrane 502 can be formed of an oxide, such as SiO₂. Insome examples, the membrane 502 can be formed of a metal, e.g., asputtered metal layer. In general, the membrane 502 is thin enough to beable to deflect responsive to pressure fluctuations in the feed channel14, 28. In addition, the membrane 502 is thick enough to be durable. Theoverall elastic modulus of the membrane 502 should be sufficient thatthe membrane will not deflect all the way to the bottom 506 of therecesses 500 under expected pressure fluctuations in operation, asotherwise the membrane 502 could break or bond to the bottom 506 of therecesses 500. For instance, the membrane can have a thickness of betweenabout 0.5 μm and about 5 μm, e.g., about 1 μm, about 2 μm, or about 3μm.

The presence of multiple recesses 500 in each feed channel 14, 28 canhelp to ensure that the compliance of the nozzle layer 11 in the feedchannel 14, 28 can be reduced even if one or more membranes 502 fail(e.g., by breaking or bonding to the bottom 506 of a recess 500).

The membrane 502 can seal the recesses 500 against fluids, such asliquids (e.g., ink) and gases (e.g., air). In some examples, therecesses 500 are vented during fabrication and then sealed such that adesired pressure is achieved in the recesses, e.g., atmospheric pressure(atm), ½ atm, or another pressure. In some examples, the recesses 500are not vented such that there is a vacuum in the recesses. Theexistence of a vacuum in the recesses 500 can increase the stress on themembrane 502 and can reduce the added compliance provided by therecesses 500.

The compliance of the nozzle layer 11 in the feed channel, including the48 recesses, can be calculated by

$C = {N\frac{\pi a^{2}}{192D}}$

where N is the number of recesses and a is the radius of each recess. Dis given by

$D = \frac{Et_{m}^{3}}{12\left( {1 - v^{2}} \right)}$

where E is the modulus of the membrane, t_(m) is the thickness of themembrane, and v is the Poisson's ratio of the membrane.

The center deflection of the membranes can be calculated by

$y_{c} = {- \frac{{qa}^{4}}{64D}}$

where q is the design pressure load of the membrane. This centerdeflection expression applies in cases in which the deflections aresmall, e.g., for a deflection of up to about 5% of the thickness of themembrane. In some examples, greater deflections can deviate from thisexpression. For instance, an example membrane 502 that is 2 μm thickdeflects 3.2 μm and is 3.5 times stiffer than predicted by thisexpression.

The tensile stress in the membrane 502 can be calculated by

$\sigma = {{0.7}5{q\left( \frac{a}{t} \right)}^{4}}$

In one specific example, 48 recesses of 100 μm radius are formed in thenozzle layer 11 in a feed channel 14, 28 having the dimensions andmodulus given above. The membrane 502 covering the recesses is formed ofSiO₂ thermal oxide and has a thickness of 2.0 μm, a modulus of 75E9 Pa,and a Poisson's ratio of 0.17. The recesses 500 are unvented. The designpressure load q is set to 150000 Pa, to account for 1 atm for the vacuumin the recesses and 0.5 atm for the purge pressure of the feed channel.

For this example, the compliance of the nozzle layer 11, the centerdeflection of the membrane 502, and the tensile stress in the membrane502 are given in the first column Table 2. Notably, the presence of the48 recesses increased the compliance of the nozzle layer by a factor ofabout nine relative to the nozzle layer without recesses (discussedabove and in Table 1).

TABLE 2 Compliance of a nozzle layer in the feed channel, centerdeflection of the membrane, and tensile stress in the membrane.Compliant membrane Standard membrane Compliance C 15.3E−18 m³/Pa 6.1E−18m³/Pa Center deflection y_(c) −4.6 μm −2.5 μm Tensile stress σ 281E6 Pa264E6 Pa

In some cases, the membrane 502 is deposited under compressive stress,which can increase the center deflection y_(c) beyond that given inTable 2. For instance, the center deflection of the membrane 502 canbecome more than half the thickness of the membrane. In thesesituations, the stiffness of the membrane is increased and the stressfor a given load is less (described in greater detail in section 11.11of Roark's Formulas for Stress and Strain, 7^(th) edition, the contentsof which are incorporated herein by reference in their entirety). Forinstance, in the example given above, the center deflection of themembrane is 2.3 times the thickness of the membrane. Thus, the stiffnessof the membrane is increased by a factor of 2.5. The compliance, centerdeflection, and tensile stress taking this increased stiffness intoaccount are given in the second column of Table 2. The compliance of thenozzle layer with recesses is still increased by a factor of 3.5relative to the nozzle layer without recesses.

These calculations show that the presence of recesses 500 in the nozzlelayer 11 can significantly increase the compliance of the nozzle layer11. A nozzle layer 11 having such recesses 500 can thus attenuate apressure fluctuation in a feed channel 14, 28 more effectively than aflat nozzle layer 11, mitigating fluidic crosstalk among fluid ejectors150 connected to that feed channel 14, 28.

FIGS. 6A-6F show one approach to fabricating fluid ejectors 150 havingrecesses 500 formed in the nozzle layer 11. Referring to FIGS. 6A and 7,a nozzle wafer 60 (e.g., a silicon wafer) includes the nozzle layer 11(e.g., a silicon nozzle layer), an etch stop layer 62 (e.g., an oxide ornitride etch stop layer, such as SiO₂ or Si₃N₄), and a handle layer 64(e.g., a silicon handle layer). In some examples, the nozzle wafer 60does not include the etch stop layer 62. In some examples, the nozzlewafer 80 is a silicon-on-insulator (SOI) wafer and the insulator layerof the SOI wafer acts as the etch stop layer 84.

Openings that will provide the nozzles 22 are formed through the nozzlelayer 11 (700), e.g., using standard microfabrication techniquesincluding lithography and etching.

Recesses 500 that extend partially, but not entirely, through the nozzlelayer 11 are also formed (702), e.g., using standard microfabricationtechniques including lithography and etching. For instance, a firstlayer of resist can be deposited onto the unpatterned nozzle layer 11and lithographically patterned. The nozzle layer 11 can be etched, e.g.,with a deep reactive ion etch (DRIE), to form the nozzles 22. The firstlayer of resist can be stripped, and a second layer of resist can thenbe deposited onto the nozzle layer 11 and lithographically patterned.The nozzle layer 11 can be etched according to the patterned resist toform the recesses 500, e.g., using a wet etch or dry etch.

Referring to FIGS. 6B and 7, a second wafer 68 having a handle layer 69and a membrane layer 70, that will provide the membrane 502 is bonded tothe nozzle wafer 60. In particular, the membrane layer 70 is bonded tothe nozzle layer 11 of the nozzle wafer 60 (704), e.g., using thermalbonding or another wafer bonding technique. The layer membrane 70 can bean oxide (e.g., SiO₂ thermal oxide).)

Referring to FIGS. 6C and 7, the handle layer 69 is removed (706), e.g.,by grinding and polishing, wet etching, plasma etching, or anotherremoval process, leaving only the membrane layer 70. Referring to FIGS.6D and 7, the membrane layer 70 is masked and etched, e.g., usingstandard microfabrication techniques including lithography and etching,to expose the nozzles 22 (708). The portions of the membrane layer 70that remain form the membrane 502 over the recesses 500.

The patterned nozzle wafer 60 having nozzles 22 and recesses 500 formedtherein can be further processed, e.g., as described in U.S. Pat. No.7,566,118, the contents of which are incorporated herein by reference intheir entirety, to form the fluid ejectors 150 of the printhead 100.Referring to FIGS. 6E and 7, in some examples, a top face 74 of thepatterned nozzle wafer 60 can be bonded to a flow path wafer 76 (710)having flow passages such as descenders 20 and other flow passages (notshown), actuators (not shown), and other elements formed therein. Forinstance, the top face 74 of the nozzle wafer 60 can be bonded to theflow path wafer 76 using low-temperature bonding, such as bonding withan epoxy (e.g., benzocyclobutene (BCB)) or using low-temperature plasmaactivated bonding.

Referring to FIGS. 6F and 7, the handle layer 64 can then be removed(712), e.g., by grinding and polishing, wet etching, plasma etching, oranother removal process. The etch stop layer 62, if present, is eitherremoved (as shown in FIG. 6F) or masked and etched, e.g., using standardmicrofabrication techniques including lithography and etching, to exposethe nozzles (714).

In some examples, a thick nozzle wafer 60 can be used (e.g., 30 μm, 50μm, or 100 μm thick). The use of a thick nozzle wafer minimizes the riskthat the nozzle fabrication process will thin the nozzle wafer to anextent that the nozzle wafer is weakened.

FIGS. 8A-8D show another approach to fabricating fluid ejectors 150having recesses 500 in the nozzle layer. Referring to FIGS. 8A and 9, anozzle wafer 80 (e.g., a silicon wafer) includes a nozzle sublayer 82(e.g., a silicon nozzle sublayer), an etch stop layer 84 (e.g., an oxideor nitride etch stop layer, such as SiO₂ or Si₃N₄), and a handle layer86 (e.g., a silicon handle layer). In some examples, the nozzle wafer 80does not include the etch stop layer 84. In some examples, the nozzlewafer 80 is a silicon-on-insulator (SOI) wafer and the insulator layerof the SOI wafer acts as the etch stop layer 84.

Openings that will provide the nozzles 22 are formed through the nozzlesublayer 82 (900), e.g., using standard microfabrication techniquesincluding lithography and etching.

Referring to FIGS. 8B and 9, a second wafer 86 includes a top layer 88,an etch stop layer 90 (e.g., an oxide or nitride etch stop layer, suchas SiO₂ or Si₃N₄), and a handle layer of silicon 92. The top layer 88can be formed of the same material as the nozzle sublayer 82 (e.g.,silicon). Recesses 500 are etched into, e.g., through, the top layer 88of the SOI wafer 86 (902), e.g., using standard microfabricationtechniques including lithography and etching. In some examples, thesecond wafer 86 is an SOI wafer and the insulator layer of the SOI waferacts as the etch stop layer 90.

Referring to FIGS. 8C and 9, the SOI wafer 86 is bonded to the nozzlewafer 80 (904), e.g., using thermal bonding or another wafer bondingtechnique, such that the top layer 88 of the SOI wafer 86 is in contactwith the nozzle sublayer 82 of the nozzle wafer 80. The recesses 500 andnozzles 22 are aligned, e.g., by utilizing bond alignment targets (notshown) fabricated on the SOI wafer 86 and the nozzle wafer 80. Forinstance, the alignment targets can include alignment indicators, suchas verniers, to show the amount of misalignment between the SOI wafer 86and the nozzle wafer 80. In some examples, the SOI wafer 86 and thenozzle wafer 80 are aligned with an alignment tool that utilizescameras, such as infrared cameras, to view the alignment targets throughthe silicon wafers.

Referring to FIGS. 8D and 9, the handle layer 92 of the SOI wafer 86 isremoved (906), e.g., by grinding and polishing, wet etching, plasmaetching, or another removal process. Referring to FIGS. 8E and 9, theinsulator layer 90 and top layer 88 are masked and etched, e.g., usingstandard microfabrication techniques including lithography and etching,to expose the nozzles 22 (908). The insulator layer 88 that remainsforms the membrane 502 over the recesses 500.

In the approach of FIGS. 8A-8E, the nozzle sublayer 82 and the top layer88 together form the nozzle layer 11. The patterned nozzle wafer 80 canbe further processed to form the fluid ejectors 150 of the printhead(910), e.g., as shown in FIGS. 6E and 6F and as described in U.S. Pat.No. 7,566,118, the contents of which are incorporated herein byreference in their entirety.

Referring to FIG. 8F, in some examples, the recesses 500 can be ventedsuch that the air in the recesses is at atmospheric pressure. Tofabricate vented recesses, straight bore vents 95 are etched into thenozzle sublayer 82 of the nozzle wafer 80 prior to bonding the nozzlewafer 80 with the SOI wafer 86. The vents 95 are etched through thethickness of the nozzle sublayer 82 and to the etch stop layer 84. Thestraight bore vents 95 are positioned such that the vents 95 will alignwith the recesses 500 when the nozzle wafer 80 is bonded with the SOIwafer 86. When the nozzles 22 are opened by removal of the handle layer86 and the etch stop layer 84, the vents 95 will be open to theatmosphere, thus venting the interior space of the recesses 500.

Referring to FIG. 10, in some examples, compliant microstructures can beadded to the side walls 172, 174 of the inlet feed channel 14 and/or theoutlet feed channel 28. For instance, one or more recess slots 170 canbe formed adjacent to one or both side walls 172, 174, leaving a sidewall membrane 176 between the recess slots 170 and the interior of thefeed channel 28. The side wall membrane 176 can deflect into the recessslots 170 in response to a pressure fluctuation to attenuate thepressure in the feed channel 14, 28. In some examples, the recess slots170 can be formed by a DRIE vertical etch of the substrate 110 prior tobonding the nozzle layer 11 to the substrate 110. In some examples, therecess slots 170 can be formed using an anisotropic etch or a DRIE etchthat is tapered outwards, where the etch is stopped by an etch stoplayer, such as a thermal oxide grown on the side walls 172, 174.

Referring to FIG. 11, in some embodiments, the compliant microstructures50 (FIG. 3) formed in the nozzle layer 11 of the inlet feed channel 14and/or the outlet feed channel 28 can be nozzle-like structures 120,which this application sometimes refers to as dummy nozzles 120. (Forclarity, we sometimes refer to the nozzles 22 of the fluid ejectors 150as firing nozzles.) The dummy nozzles 120 are located in the feedchannels 14, 28, and are not directly connected to or associated withany individual fluid ejector 150 and do not have correspondingactuators. The fluid pressure in the feed channels 14, 28 is generallynot high enough to cause fluid to be ejected from the dummy nozzles 120during normal operation. For instance, the fluid ejector 150 can operateat an ejection pressure of a few atmospheres (e.g., about 1-10 atm) anda threshold pressure for ejection can be about half of the operatingpressure.

The dummy nozzles 120 extend through the entire thickness of the nozzlelayer 11 and provide a free surface that increases the compliance of thenozzle layer 11. Each dummy nozzle 120 includes an inward facing opening122 on an internal surface 124 of the nozzle layer 11 and an outwardfacing opening 126 on an external surface 128 of the nozzle layer 11(e.g., the surface that faces toward the printing surface). A meniscus130 of fluid is formed at the outward facing opening 126 of each dummynozzle 120 (shown for only one dummy nozzle 120 in FIG. 11). In someexamples, the feed channel 14, 28 is negatively pressurized such that,in the absence of a pressure fluctuation, the meniscus 130 is drawninward from the opening 126 (e.g., a concave meniscus). When a pressurefluctuation propagates into the feed channel 14, 28, the meniscus 130bulges out (e.g., a convex meniscus), attenuating the pressurefluctuation and mitigating fluidic crosstalk among neighboring fluidejectors 150 connected to that feed channel 14, 28.

In some examples, the dummy nozzles 120 are similar in size and/or shapeto the firing nozzles 22. For instance, the dummy nozzles 120 can be agenerally cylindrical path of constant diameter, in which the inwardfacing opening 122 and the outward facing opening 126 have the samedimension. The dummy nozzles 120 can be a tapered, conically shaped pathextending from a larger inward facing opening 122 to a smaller outwardfacing opening 126. The dummy nozzles 120 can include a curvilinearquadratic shaped path extending from a larger inward facing opening 122to a smaller outward facing opening 126. The dummy nozzles 120 caninclude multiple cylindrical regions of progressively smaller diametertoward the outward facing opening 126.

When the dummy nozzles 120 are similar in size to the firing nozzles 22,the bubble pressure of the dummy nozzles 120 and the firing nozzles 22is also similar. However, because the fluid pressure is generally lowerin the feed channels 14, 28 than in the fluid ejectors 150, fluid can beejected from the firing nozzles 22 without causing accidental dischargethrough the dummy nozzles 120. In some examples, the dummy nozzles 120can have a different size than the firing nozzles 22.

In some examples, the ratio of the thickness of the dummy nozzles 120(e.g., the thickness of the nozzle layer 11) and the diameter of theoutward facing opening 128 can be about 0.5 or greater, e.g., about 1 to4, or about 1 to 2. For instance, the radius of the outward facingopening 128 can be between about 5 μm and about 80 μm, e.g., about 10 μmto about 50 μm. For a tapered shape, the cone angle of the conicallyshaped path of the dummy nozzles 120 can be, e.g., between about 5° andabout 45°. In general, the dummy nozzles 120 are small enough that largecontaminant particles capable of clogging the firing nozzles 22 cannotenter the feed channels 14, 28 through the dummy nozzles 120.

In some examples, the printhead 100 can be purged at high fluidpressure, e.g., to clean the fluid flow passages. The high fluidpressure during a purge can cause fluid to be ejected from the dummynozzles 120. To reduce fluid loss through the dummy nozzles 120 duringsuch a purge, a small number of dummy nozzles 120 can be formed in eachfeed channel 14, 28. For instance, 1 to 20 dummy nozzles 120 can beformed in each feed channel 14, 28, e.g., about 1, 2, or 4 dummy nozzlesper firing nozzle. In some examples, the dummy nozzles 120 can be cappedduring a purge such that little or no fluid is lost through the dummynozzles 120.

FIG. 12 shows an example approach to fabricating fluid ejectors 150having dummy nozzles 120 formed in the nozzle layer 11. A nozzle wafer140 includes the nozzle layer 11, an etch stop layer 142 (e.g., an oxideor nitride etch stop layer, such as SiO₂ or Si₃N₄), and a handle layer124 (e.g., a silicon handle layer). In some examples, the nozzle wafer120 does not include the etch stop layer 122.

The firing nozzles and dummy nozzles 120 are formed through the nozzlelayer 11, e.g., using standard microfabrication techniques includinglithography and etching. In some implementations, the firing nozzles 22and dummy nozzles 120 are formed in the nozzle layer 11 at the sametime, e.g., using the same etching step.

After formation of the firing nozzles 22 and dummy nozzles 120,fabrication can proceed substantially as shown and described withrespect to FIGS. 6B-6F, albeit with the dummy nozzles 120 replacing therecesses 500.

Because the dummy nozzles 120 during processing steps that would haveoccurred to form the firing nozzles 22, there is little to no costimpact associated with forming the dummy nozzles 120. In the exampleshown, the firing nozzles 22 and the dummy nozzles 120 are the samesize. In some examples, the firing nozzles 22 and the dummy nozzles 120can have different sizes.

Particular embodiments have been described. Other embodiments are withinthe scope of the following claims.

1. (canceled)
 2. A method comprising: forming a feed channel andmultiple pumping chambers in a substrate, wherein the feed channel isfluidically connected to the multiple pumping chambers; forming multiplenozzles in the substrate, each nozzle defining an opening in a bottomsurface of the substrate, such that each nozzle is fluidically connectedto a corresponding one of the pumping chambers; forming an actuator foreach pumping chamber, the actuator configured to cause fluid to beejected from the pumping chamber and corresponding nozzle; and forming acompliant structure comprising one or more recesses such that a firstopening of each recess is defined on a wall of the feed channel and suchthat each recess is fluidically connected to a second opening defined inthe bottom surface of the substrate, wherein the compliant structure ismore compliant than the wall of the feed channel.
 3. The method of claim2, comprising forming the multiple nozzles to be arranged along a line,and wherein the feed channel is laterally offset from the line.
 4. Themethod of claim 2, wherein the recesses comprise dummy nozzles formed ina bottom wall of the feed channel such that the second openings definedin the bottom surface of the substrate are a second opening of eachrecess.
 5. The method of claim 4, wherein forming the compliantstructure comprises forming each recess such that the first opening islarger than the second opening.
 6. The method of claim 4, whereinforming the compliant structure comprises forming each recess to have acurvilinear quadratic shaped path from the first opening to the secondopening.
 7. The method of claim 2, forming a membrane over the firstopening of each recess to seal each recess from the feed channel.
 8. Themethod of claim 7, wherein forming a membrane comprises disposing amembrane over the first opening of each recess.
 9. The method of claim2, comprising forming the membrane of silicon.
 10. The method of claim2, comprising forming the compliant structure by etching the one or morerecesses into the substrate.
 11. The method of claim 2, comprisingforming the compliant structure in a top wall of the feed channel. 12.The method of claim 2, comprising forming the compliant structure in aside wall of the feed channel.
 13. The method of claim 2, wherein thefeed channel is connected to each of the pumping chambers by arespective inlet passage and wherein each of the pumping chambers isconnected to the corresponding nozzle by a descender.
 14. The method ofclaim 13, comprising forming a second compliant structure comprising oneor more second recesses such that a first opening of each recess isdefined on a wall of an outlet feed channel, the outlet feed channelbeing connected to each of the descenders by an outlet passage.
 15. Themethod of claim 2, wherein actuation of one of the actuators causes achange in fluid pressure in the feed channel, and wherein the compliantstructure is configured to at least partially attenuate the change influid pressure in the feed channel.
 16. The method of claim 15,comprising forming the compliant structure such that the change in fluidpressure is sufficient to deflect a meniscus of fluid in the recess. 17.The method of claim 2, comprising forming the compliant structure suchthat each of the one or more recesses is the same size as each of thenozzles.
 18. The method of claim 2, wherein forming the compliantstructure comprises forming the recesses such that the first opening ofeach recess is circular.
 19. The method of claim 2, wherein forming thecompliant structure comprises forming the recesses such that the firstopenings are arranged in an array on the wall of the feed channel.